Modification of materials by high energy plasma ions

The high-power iodine laser of the Prague Asterix Laser System (PALS), emitting radiation at 438 nm wavelength, 400 ps pulse duration and about 250 J maximum pulse energy, was employed to irradiate in vacuum a germanium target. The amount, the energy and the charge state of the ions emitted from the laser-produced plasma are analyzed by time-of-flight measurements performed with the use of ion collectors (ICs) and an electrostatic ion energy analyzer (IEA). Energetic Ge ions emitted from the laser-produced plasma were directly implanted into C substrates placed at 30 cm distance from the target and 30 degrees angle with respect to the normal to the target surface. The implantation depths and implanted doses were analyzed by two different techniques: the Rutherford backscattering spectrometry (RBS) and the laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS).