FexNi100-x nanometric films were deposited on SiO2/Si substrates at room temperature using the pulsed laser deposition technique. The targets were Fe-Ni amorphous magnetic foils with composition Fe50Ni50, Fe35Ni65 and Fe22Ni78. Morphological and structural properties of the deposited films were investigated using scanning electron microscopy, Rutherford backscattering spectrometry, grazing incidence X-ray diffraction, and X-ray reflectivity. Electrical and magnetic characteristics of the films were investigated by using the four-point probe and the magneto-optic Kerr effect techniques, respectively. The film properties are strictly dependent on the Fe-Ni compositional ratio.
FexNi100-x Nanometric Films Deposited by Laser Ablation on SiO2/Si Substrates.
CARICATO, Anna Paola;LEGGIERI, Gilberto;LUCHES, Armando;MARTINO, Maurizio;
2007-01-01
Abstract
FexNi100-x nanometric films were deposited on SiO2/Si substrates at room temperature using the pulsed laser deposition technique. The targets were Fe-Ni amorphous magnetic foils with composition Fe50Ni50, Fe35Ni65 and Fe22Ni78. Morphological and structural properties of the deposited films were investigated using scanning electron microscopy, Rutherford backscattering spectrometry, grazing incidence X-ray diffraction, and X-ray reflectivity. Electrical and magnetic characteristics of the films were investigated by using the four-point probe and the magneto-optic Kerr effect techniques, respectively. The film properties are strictly dependent on the Fe-Ni compositional ratio.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
